Preparation and Characterization of Ni-Doped Materials for Photocurrent and Photocatalytic Applications
Figure 1
XRD patterns of Ni-doped TiO2 powders, where Ni = 0, 0.1 to 0.9 at. wt.% (a), and Ni = 1 to 10 at. wt.% (b), formed at 550°C for 6 h. Rutile TiO2: ICDD File number: 03-065-1118; anatase TiO2: ICDD File number: 03-065-5714; NiTiO3: ICDD File number: 04-006-6640.