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The Scientific World Journal
Volume 2014 (2014), Article ID 106029, 9 pages
Research Article

Growth and Etch Rate Study of Low Temperature Anodic Silicon Dioxide Thin Films

MEMS and Micro/Nano Systems Laboratory, Department of Physics, Indian Institute of Technology Hyderabad, Medak, Andhra Pradesh 502205, India

Received 26 August 2013; Accepted 1 December 2013; Published 2 February 2014

Academic Editors: R. M. Guedes and Y. Xiong

Copyright © 2014 Akarapu Ashok and Prem Pal. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Citations to this Article [3 citations]

The following is the list of published articles that have cited the current article.

  • Seo Young Yoon, Yi-Seul Park, and Jin Seok Lee, “Local Liquid Phase Deposition of Silicon Dioxide on Hexagonally Close-Packed Silica Beads,” Langmuir, vol. 31, no. 1, pp. 249–253, 2015. View at Publisher · View at Google Scholar
  • Mingrui Zhao, Rajesh Balachandran, Zach Patterson, Roman Gouk, Steven Verhaverbeke, Farhang Shadman, and Manish Keswani, “Contactless bottom-up electrodeposition of nickel for 3D integrated circuits,” RSC Adv., vol. 5, no. 56, pp. 45291–45299, 2015. View at Publisher · View at Google Scholar
  • Akarapu Ashok, and Prem Pal, “Investigation of room temperature deposited silicon dioxide thin films for surface texturisation of monocrystalline {100} silicon,” Micro & Nano Letters, vol. 11, no. 1, pp. 62–66, 2016. View at Publisher · View at Google Scholar