The Effect of Annealing on the Structural and Optical Properties of Titanium Dioxide Films Deposited by Electron Beam Assisted PVD

Table 1

Summary of the structural and optical properties of TiO₂ films characterized by XRD, AFM, SE, and spectrophotometry. Crystallite size for annealed samples calculated through the Scherrer equation. Roughness values for 1 μm × 1 μm AFM scans for TiO₂ samples, as deposited and annealed at various temperatures. Layer thickness obtained from the single layer Cauchy model.

Sample	Primary crystallite size (nm)	Surface roughness (nm)	Layer thickness from SE (nm)	Reflectivity %	Minimum reflectance wavelength (nm)
TAD	—	0.73	96.1 ± 0.2	0.64	758
T500	13.4	0.74	87.3 ± 0.1	0.40	706
T600	15.1	0.88	86.8 ± 0.1	0.41	712
T700	18.7	0.77	88.1 ± 0.1	0.43	718
T800	26.6	2.74	79.5 ± 0.1	2.49	744