Electric and Magnetic Properties of Sputter Deposited BiFeO3 Films
Figure 5
SEM images of a 125 nm thick BiFeO3 film prepared at a source-to-substrate distance of . (a) was obtained with accelerating voltage of 10 kV. (b) was obtained with 2.5 kV. Large (~50 μm) grains are observed along with smaller features related to the ferroelectric domain structure.
