Study of Alloying Process on 40Cr Surface with Electron Beam after Electroplated Cr Layer

<table class="table-group" id="tab1"><tr><td><table class="table"><tr><td class="thead-hr" colspan="4"><hr/></td></tr><tr class="thead"><td align="left">Level</td><td align="center">Accelerating voltage (kV)</td><td align="center">Pulse frequency (times)</td><td align="center">Film thickness (<i>μ</i>m)</td></tr><tr><td class="thead-hr" colspan="4"><hr/></td></tr><tr><td align="left">1</td><td align="center">13</td><td align="center">3</td><td align="center">1</td></tr><tr><td align="left">2</td><td align="center">20</td><td align="center">14</td><td align="center">2</td></tr><tr><td align="left">3</td><td align="center">27</td><td align="center">25</td><td align="center">3</td></tr><tr class="table-tr"><td colspan="4"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

The level and factors of orthogonal experiment.

Advances in Materials Science and Engineering

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Table 1

Table 1: Study of Alloying Process on 40Cr Surface with Electron Beam after Electroplated Cr Layer 