Fabrication of Ni-Mn Microprobe Structure with Low Internal Stress and High Hardness by Employing DC Electrodeposition
Figure 4
The cross-sectional micrographs of TEM examinations on the coatings prepared at different current densities: (a) 2 A/dm2, (b) 8 A/dm2, (c) 10 A/dm2, and (d) 12 A/dm2. Single arrow denotes the direction of columnar grain, while double arrows indicate the presence of twins. The corresponding insets are the SAED patterns measured at location of pointed arrows.
