Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films

<div>TC(111)/TC(220) ratio and residual stress versus annealing temperatures of 1.0 <i>μ</i>m, 1.6 <i>μ</i>m, and 3.0 <i>μ</i>m.</div>

Advances in Materials Science and Engineering

Figure 11: Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films 