Journals
Publish with us
Publishing partnerships
About us
Blog
Advances in Materials Science and Engineering
Journal overview
For authors
For reviewers
For editors
Table of Contents
Special Issues
Advances in Materials Science and Engineering
/
2015
/
Article
/
Tab 2
/
Research Article
Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films
Table 2
Grain size
(nm) for the Cu films with different thicknesses and annealing temperatures.
Annealing temperature (°C)
Thickness (
μ
m)
1.0
1.6
3.0
As-deposited
66
88
91
300
100
124
143
400
120
165
170
500
375
405
550