Influence of Elements on the Corrosion Resistance of DLC Films
Table 1
Deposition of pure DLC, Si-DLC, and Si-N-DLC films.
Film type
Gaseous mixture
Bias voltage (kV)
RF power (W)
Deposition pressure (Pa)
Gas flow rate ratio
Actual gas flow (sccm)
Pure DLC
C2H2
300
2
—
18
Si-DLC
C2H2 : TMS
300
2
2 : 1
11.4 : 5.7
1 : 4
3.7 : 14.8
Si-N-DLC
C2H2 : TMS : N2
300
2-3
14 : 1 : 1
14 : 1 : 1
14 : 1 : 2
14 : 1 : 2
14 : 1 : 3
14 : 1 : 3
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