Influence of Elements on the Corrosion Resistance of DLC Films

Table 1

Deposition of pure DLC, Si-DLC, and Si-N-DLC films.

Film type	Gaseous mixture	Bias voltage (kV)	RF power (W)	Deposition pressure (Pa)	Gas flow rate ratio	Actual gas flow (sccm)
Pure DLC	C2H2		300	2	—	18
Si-DLC	C2H2 : TMS		300	2	2 : 1	11.4 : 5.7
					1 : 4	3.7 : 14.8
Si-N-DLC	C2H2 : TMS : N2		300	2-3	14 : 1 : 1	14 : 1 : 1
					14 : 1 : 2	14 : 1 : 2
					14 : 1 : 3	14 : 1 : 3