Effect of HPPMS Pulse-Frequency on Plasma Discharge and Deposited AlTiN Coating Properties

Table 1

Process parameters for heating, cleaning, and deposition of the (Al,Ti)N coatings in the present study.

Process	Time	Parameter	Value and unit
(1) Heating and evacuation	90 min	Heating power; starting pressure	10 kW; 8.0 mPa
(2) Substrate cleaning	30 min	Ion etching power	9 kW
(3) Deposition of (Al,Ti)N	30 min (per various frequency)	Frequency; Duty cycle; Period duration; Pulse length; Mean dc cathode Power; Sputtering gas Pressure; Ar partial Pressure; Kr partial Pressure; N2 partial Pressure; Temperature; dc bias voltage	100/200/300/400/500 [Hz]; 0.5/1.0/1.5/2.0/2.5 [%]; 10.0/5.0/3.3/2.5/2.0 [ms]; 50 μs (const.); 4 kW (const.); 0.6 Pa (const.); 414 mPa; 103 mPa; 83 mPa; 500°C (const.); −100 V (const.)