Effect of Argon-Oxygen Mixing Gas during Magnetron Sputtering on TiO₂ Coatings

Table 1

Sputtering conditions for the deposition of TiO₂ coatings.

Target	Pure Ti metal (Ф76 × 5 mm) (99.95%)
Substrate	Stainless steel
Target-substrate distance	3 cm
Sputtering gas	Ar
Reactive sputtering gas	O2
Flux rate of oxygen	5, 10, 20, and 30%
Sputtering gas pressure	30 mTorr
Bias substrate	V
Deposition time	60 min
Power sputtering	200 W
Substrate temperature	Not heated