Research Article
Effect of Argon-Oxygen Mixing Gas during Magnetron Sputtering on TiO2 Coatings
Table 1
Sputtering conditions for the deposition of TiO2 coatings.
| Target | Pure Ti metal (Ф76 × 5 mm) (99.95%) | Substrate | Stainless steel | Target-substrate distance | 3 cm | Sputtering gas | Ar | Reactive sputtering gas | O2 | Flux rate of oxygen | 5, 10, 20, and 30% | Sputtering gas pressure | 30 mTorr | Bias substrate | V | Deposition time | 60 min | Power sputtering | 200 W | Substrate temperature | Not heated |
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