| Coating methods | Thickness | Benefits | Drawbacks | Refs. |
| Sol-gel | <1 μm | Coat complex shapes, low cost (thin), low processing temperature, high purity | Controlled atmosphere required, costly raw materials | [34, 68, 69] |
| Sputter processes | 0.5–3 μm | Thickness uniformity on Coat flat substrate, good adhesion, dense coating | High cost, time consuming, produces amorphous coatings | [67] |
| Plasma spray | <20 μm | High deposition efficiency, low cost, reduced risk of coat degradation | High temperature led to grain growth, Amorphous coatings, poor adhesion | [70–72] |
| PLD | 0.05–5 μm | Crystalline and amorphous coating, dense and porous coating | High cost, time, no uniformity in thickness consuming, surface need to be pretreated | [73–76] |
| ESD | 1–10 μm | Low cost, uniformity in coating flat substrate | Coats only visible area, it is fragile | [77–79] |
| Electrophoretic coating | 0.1–2.0 mm | Uniformity in coating thickness, coat complex substrate, rapid deposition rate | Produces cracks coated surface, high sintering temperature required | [80–82] |
| Hot (isostatic) pressing | 0.2–2.0 mm | Dense coating is achieved, coat any dimension | Requires high temperature, complex shapes cannot be coat, high cost, mismatch thermal expansion, differences in elastic property | [83, 84] |
| Dip coating | | Complex 3D and porous substrate can be coat, low cost, faster application | Requires high temperature for sintering, fragile due to thickness, amorphous due to thermal expansion | [85] |
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