Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

<div>Composition of (a) Cu-DLC and (b) Ti-DLC films as a function of C<sub>2</sub>H<sub>4</sub> flow rate, with a fixed Ar flow rate of 20 sccm.</div>

Advances in Materials Science and Engineering

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Figure 4

Figure 4: Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties 