Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

<div>SIMS depth profiles of Cu-DLC films prepared by a flow of 20 sccm argon and different C<sub>2</sub>H<sub>4</sub> flow rates of (a) 2 sccm and (b) 6 sccm.</div>

Advances in Materials Science and Engineering

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Figure 5

Figure 5: Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties 