Research Article

Frequency Dependence of Characteristics of MOS Capacitors Containing Nanosized High-κ Ta2O5 Dielectrics

Table 2

Equivalent oxide thickness (), flat band voltage () obtained from C-V curves measured at 100 kHz, ideal flat band voltage (), and determined oxide charge ().

Gate (nm) (V) (V) (1012 cm−2)

Al2.27−0.91−0.592.8
W2.71−0.86−0.294.6
Au3.44−0.780.186.0