Two Kinds of Hydrogen Monomers Manifested in Plasma-Exposed Silicon

Figure 1

Hole depth profile in a sample of N_B = 5 × 10¹⁸ cm⁻³ annealed at 150°C for 30 min. (a) Fitting by in-diffusion of one kind of H⁺. Curve 1: with D⁺K = 8 × 10⁴ cm⁻¹s⁻¹, X = 21.2; curve 2: with D⁺K = 1.4 × 10⁴ cm⁻¹s⁻¹, X = 115. (b) Fitting by in-diffusion of two kinds of H⁺ with the parameters specified in the text.

(a)

(b)