Investigation of Structure and Optical Properties for Copper Oxide Thin Films on Plastic Substrate by Helicon Plasma DC Magnetron Sputtering Technique

Table 1

Formation conditions.

Condition name	(A)	(B)	(C)	(D)
Substrate	PMMA, PC, glass (EAGLE XG)
Temperature set in an infrared lamp controller (°C)	Noncontrolled (room temperature)	45	Noncontrolled (room temperature)	45
Deposition temperature (DT) measured by a nonreversible temperature label (°C)	38	90	48	100
RF helicon plasma power (W)	50
DC sputtering power (W)	10		30
Cu sputtering rate (nm/sec)	0.015		0.046
O2 and Ar gas flow rate (sccm)	10 and 15
Film thickness (nm)	200