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ElectroComponent Science and Technology
Volume 4 (1977), Issue 3-4, Pages 171-177

Criteria of Low-Noise Thick-Film Resistors

Eindhoven University of Technology, Department of Electrical Engineering, Eindhoven, The Netherlands

Received 8 June 1977

Copyright © 1977 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Our simple model of the noise of a thick-film resistor leads to two limiting cases. For thick-film resistors with a conduction dominated by the glass interface, the relative noise is proportional to the sheet resistance, R. For thick film resistors, where the conduction is mainly dominated by the current constrictions in the contact areas between grains, the relative noise is proportional to R3. Both trends have been observed. Some criteria of low-noise thick-film resistors are derived from the developed noise relations.

The major conclusion is that measurements of the noise index are a nondestructive way to check quantitatively the operations used to manufacture high-quality thick-film resistors. Inadequate materials or treatments, weak or brittle wire bonds and reliability are easily detected by 1/f noise measurements.