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ElectroComponent Science and Technology
Volume 6 (1980), Issue 3-4, Pages 231-233

TiNx Thin-Film Resistors for Hybrid Integrated Circuits

Institute of Electron Technology of Technical University, Wrocław 50-370, Poland

Received 7 July 1979

Copyright © 1980 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


TiNx thin-films have been evaluated for use as thin-film resistors. Thin-films were obtained by reactive triode sputtering of titanium in nitrogen atmosphere on crystallized glass substrates. In the resistive TiNx layers, the value of x was 0.96.2 The value of the sheet resistance of the tested layers was 30 ohm/sq. Stability and TCR were measured during accelerated ageing.