International Microelectronics Conference. Part IIView this Special Issue
Vladimír Ryšanek, "The Anomalous Properties of Polysiloxane Films", Active and Passive Electronic Components, vol. 8, Article ID 176098, 3 pages, 1981. https://doi.org/10.1155/APEC.8.241
The Anomalous Properties of Polysiloxane Films
An electron beam was used to create thin polysiloxane films from methylphenylsiloxane and the anomalous properties of permittivity and temperature dependence, the resistivity dependence on humidity and the permittivity dependence on pressure of air or argon, was examined. These anomalous properties can be potentially applicable to humidity probes, pressure gauges and for miniature capacitors.
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