Table of Contents Author Guidelines Submit a Manuscript
International Journal of Optics
Volume 2010, Article ID 137572, 18 pages
http://dx.doi.org/10.1155/2010/137572
Research Article

Substrate Effect on the Optical Reflectance and Transmittance of Thin-Film Structures

Electronics Department, Saint Petersburg State Electrotechnical University, Saint Petersburg 197376, Russia

Received 8 September 2010; Accepted 3 November 2010

Academic Editor: Robert G. Elliman

Copyright © 2010 Anatoly Barybin and Victor Shapovalov. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. M. Born and E. Wolf, Principles of Optics, Pergamon, Oxford, UK, 4th edition, 1968.
  2. S. Tolansky, Muliple-Beam Interferometry of Surfaces and Films, Oxford University, London, UK, 1948.
  3. H. Mayer, Physik Dünne Schichten, Wissenschaftliche Verlagsgesellschaft, Stuttgart, Germany, 1950.
  4. S. Methfessel, Dünne Schichten, VEB Wilhelm Knapp, Halle, Germany, 1953.
  5. O. S. Heavens, Optical Properties of Thin Solid Films, Butterworths, London, UK, 1955.
  6. A. Vasicek, Optics of Thin Films, North Holland, Amsterdam, The Netherlands, 1960.
  7. D. Clarke and J. F. Grainger, Polarized Light and Optical Measurements, Pergamon, Oxford, UK, 1971.
  8. F. Abeles, “Investigations on the propagation of sinusoidal electromagnetic waves in stratified media: application to thin films,” Annales de Physique, vol. 5, pp. 596–640, 1950. View at Google Scholar
  9. P. H. Berning, “Theory and calculations of optical thin films,” in Physics of Thin Films, G. Hass, Ed., vol. 1, pp. 69–121, Academic Press, New York, NY, USA, 1963. View at Google Scholar
  10. O. S. Heavens, “Measurement of optical constants of thin films,” in Physics of Thin Films, G. Hass and R. E. Thun, Eds., vol. 2, pp. 193–238, Academic Press, New York, NY, USA, 1964. View at Google Scholar
  11. H. E. Bennett and J. M. Bennett, “Measurement of optical constants of thin films,” in Physics of Thin Films, G. Hass and R. E. Thun, Eds., vol. 4, pp. 1–96, Academic Press, New York, NY, USA, 1967. View at Google Scholar
  12. F. Abeles, “Optical properties of metallic films,” in Physics of Thin Films, M. H. Francombe and R. W. Hoffman, Eds., vol. 6, pp. 151–204, Academic Press, New York, NY, USA, 1967. View at Google Scholar
  13. N. R. Rama Rao, R. Chandramani, and G. M. Rao, “Tantalum oxide films prepared by unbalanced reactive magnetron sputtering,” Journal of Materials Science Letters, vol. 18, no. 23, pp. 1949–1951, 1999. View at Publisher · View at Google Scholar · View at Scopus
  14. K. M. A. Salam, H. Konishi, M. Mizuno, H. Fukuda, and S. Nomura, “Structural and electrical properties of crystalline (1x)Ta2O5xTio2 thin films fabricated by metalorganic decomposition,” Applied Surface Science, vol. 190, no. 1-4, pp. 88–95, 2002. View at Publisher · View at Google Scholar · View at Scopus
  15. R. A. Silva, M. Walls, B. Rondot, M. Da Cunha Belo, and R. Guidoin, “Electrochemical and microstructural studies of tantalum and its oxidefilms for biomedical applications in endovascular surgery,” Journal of Materials Science, vol. 13, pp. 495–500, 2002. View at Google Scholar
  16. N. Negishi, K. Takeuchi, and T. Ibusuki, “Preparation of the TiO thin film photocatalyst by the dip-coating process,” Journal of Sol-Gel Science and Technology, vol. 13, no. 1-3, pp. 691–694, 1999. View at Google Scholar · View at Scopus
  17. T. Watanabe, S. Fukayama, M. Miyauchi, A. Fujishima, and K. Hashimoto, “Photocatalytic activity and photo-induced wettability conversion of TiO2 thin film prepared by sol-gel process on a soda-lime glass,” Journal of Sol-Gel Science and Technology, vol. 19, pp. 71–76, 2000. View at Google Scholar
  18. Z. Huang, P. C. Maness, D. M. Blake, E. J. Wolfrum, S. L. Smolinski, and W. A. Jacoby, “Bactericidal mode of titanium dioxide photocatalysis,” Journal of Photochemistry and Photobiology A, vol. 130, no. 2-3, pp. 163–170, 2000. View at Google Scholar · View at Scopus
  19. T. Takahashi, H. Nakabayashi, and W. Mizuno, “Effects of plasma exposure on structural and optical properties of TiO2 films deposited by off-axis target sputtering,” Journal of Vacuum Science and Technology A, vol. 20, no. 6, pp. 1916–1920, 2002. View at Publisher · View at Google Scholar · View at Scopus
  20. J. F. Hall and W. F. C. Ferguson, “Optical properties of cadmium sulfide and zinc sulfide from 0.6 micron to 14 micron,” Journal of the Optical Society of America, vol. 45, pp. 714–718, 1955. View at Google Scholar
  21. S. P. Lyashenko and V. K. Miloslavskii, “A simple method for the determination of thickness and optical constants of semiconductor and dielectric layers,” Optics and Spectroscopy, vol. 16, pp. 80–81, 1964. View at Google Scholar
  22. J. C. Burgiel, Y. S. Chen, and F. Vratny, “Refractive index of ZnO, ZnS and several thin-film insulators,” Journal of The Electrochemical Society, vol. 115, pp. 729–732, 1968. View at Google Scholar
  23. J. C. Manifacier, J. Gasiot, and J. P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film,” Journal of Physics E, vol. 9, no. 11, article no. 032, pp. 1002–1004, 1976. View at Publisher · View at Google Scholar · View at Scopus
  24. R. Swanepoel, “Determination of the thickness and optical constants of amorphous silicon,” Journal of Physics E, vol. 16, no. 12, article no. 023, pp. 1214–1222, 1983. View at Publisher · View at Google Scholar · View at Scopus
  25. R. Swanepoel, “Determining refractive index and thickness of thin films from wavelength measurements only,” Journal of the Optical Society of America A, vol. 2, pp. 1339–1343, 1985. View at Google Scholar
  26. H. Demiryont, J. R. Sites, and K. Geib, “Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering,” Applied Optics, vol. 24, pp. 490–495, 1985. View at Google Scholar
  27. K. Ayadi and N. Haddaoui, “New approach to the determination of optical constants and thickness of thin dielectric transparent films,” Journal of Materials Science: Materials in Electronics, vol. 11, no. 2, pp. 163–167, 2000. View at Publisher · View at Google Scholar · View at Scopus
  28. N. Martin, C. Rousselot, C. Savall, and F. Palmino, “Characterizations of titanium oxide films prepared by radio frequency magnetron sputtering,” Thin Solid Films, vol. 287, no. 1-2, pp. 154–163, 1996. View at Google Scholar · View at Scopus
  29. Y. Q. Hou, D. M. Zhuang, G. Zhang, M. Zhao, and M. S. Wu, “Influence of annealing temperature on the properties of titanium oxide thin film,” Applied Surface Science, vol. 218, no. 1–4, pp. 97–105, 2003. View at Publisher · View at Google Scholar · View at Scopus
  30. M. Laurikaitis, J. Dudonis, and D. Milčius, “Deposition of zirconium oxynitride films by reactive cathodic arc evaporation and investigation of physical properties,” Thin Solid Films, vol. 516, no. 7, pp. 1549–1552, 2008. View at Publisher · View at Google Scholar · View at Scopus
  31. S. V. Jagadeesh Chandra, S. Uthanna, and G. Mohan Rao, “Effect of substrate temperature on the structural optical and electrical properties of dc magnetron sputtered tantalum oxide films,” Applied Surface Science, vol. 254, pp. 1953–1960, 2008. View at Google Scholar
  32. S. G. Tomlin, “More formulae relating to optical reflection and transmission by thin films,” Journal of Physics D, vol. 5, no. 4, article no. 328, pp. 847–851, 1972. View at Publisher · View at Google Scholar · View at Scopus