International Journal of Photoenergy / 2013 / Article / Fig 6

Research Article

Surface Passivation and Antireflection Behavior of ALD on n-Type Silicon for Solar Cells

Figure 6

Effective minority carrier lifetime of 30 nm TiO2 thin films deposited at 200°C in three cases: after deposition, five months, and cofire.
431614.fig.006

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