International Journal of Photoenergy / 2013 / Article / Tab 1

Research Article

Surface Passivation and Antireflection Behavior of ALD on n-Type Silicon for Solar Cells

Table 1

Estimation of grain size of TiO2 thin films by SEM and XRD.

ALD 200°CALD 300°CALD 400°CALD 500°C

Grain size from SEM (nm)110704570
Grain size from XRD (nm)39312225

We are committed to sharing findings related to COVID-19 as quickly as possible. We will be providing unlimited waivers of publication charges for accepted research articles as well as case reports and case series related to COVID-19. Review articles are excluded from this waiver policy. Sign up here as a reviewer to help fast-track new submissions.