Non-Thermal Plasma: A Promising Technology for the Germination Enhancement of Radish (<i>Raphanus sativus</i>) and Carrot (<i>Daucus carota sativus</i> L.)

<div>Influence of CAPP exposure on the mean germination rate of (a) radish and (b) carrot.</div>

Journal of Food Quality

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Figure 8

Figure 8: Non-Thermal Plasma: A Promising Technology for the Germination Enhancement of Radish (<i>Raphanus sativus</i>) and Carrot (<i>Daucus carota sativus</i> L.) 

Figure 8 | Non-Thermal Plasma: A Promising Technology for the Germination Enhancement of Radish (Raphanus sativus) and Carrot (Daucus carota sativus L.) 