Research Article

Temperature-Dependent Physical and Memory Characteristics of Atomic-Layer-Deposited RuO𝑥 Metal Nanocrystal Capacitors

Figure 4

Plane view TEM image of the R u O 𝑥 metal nanocrystals in an n-Si/SiO2/HfO2/ R u O 𝑥 /Al2O3/Pt memory capacitor at PDA 850°C. Isolated R u O 𝑥 nanocrystals are observed clearly.
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