Temperature-Dependent Physical and Memory Characteristics of Atomic-Layer-Deposited RuO_𝑥 Metal Nanocrystal Capacitors

Figure 6

(a) XPS spectra of the Ru3d electrons with different annealing temperatures from 850–1000°C; (b) Ru3d electrons at a PDA of 1000°C is deconvoluted.

(a)

(b)