Directed Self-Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch2 and Beyond
Figure 1
Schematic illustration of lithography approach for high-density BPM master template fabrication by combining rotary stage e-beam lithography with a bottom-up DSA process. Rotary stage e-beam lithography is first used to write a low-density prepattern that has either (a) chemical contrast, (b) low-topographic contrast, such as a 2D dots array, or (c) high-topographic contrast, such as 1D grooves. The prepattern is then used as guiding structure to perform a DSA process. A high-density BCP pattern can be achieved via BCP density multiplication.
