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Journal of Nanomaterials
Volume 2013 (2013), Article ID 621531, 10 pages
Review Article

Advances in Optical and Magnetooptical Scatterometry of Periodically Ordered Nanostructured Arrays

Institute of Physics, Faculty of Mathematics and Physics, Charles University, Ke Karlovu 5, 12116 Prague, Czech Republic

Received 26 November 2012; Accepted 27 December 2012

Academic Editor: Yue Li

Copyright © 2013 Martin Veis and Roman Antos. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


We review recent advances in optical and magnetooptical (MO) scatterometry applied to periodically ordered nanostructures such as periodically patterned lines, wires, dots, or holes. The techniques are based on spectroscopic ellipsometry (SE), either in the basic or generalized modes, Mueller matrix polarimetry, and MO spectroscopy mainly based on MO Kerr effect measurements. We briefly present experimental setups, commonly used theoretical approaches, and experimental results obtained by SE and MO spectroscopic analyses of various samples. The reviewed analyses are mainly related to monitoring optical critical dimensions such as the widths, depths, and periods of the patterned elements, their real shapes, and their line edge or linewidth roughness. We also discuss the advantages and disadvantages of the optical spectroscopic techniques compared to direct monitoring techniques.