Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL<sub>2</sub>O<sub>3</sub>–TiC Substrate

<table>XPS spectrum of polymer redeposition at point #1 (a) and point #2 (b).</table>

Journal of Nanomaterials

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Figure 6

Figure 6: Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL<sub>2</sub>O<sub>3</sub>–TiC Substrate 

Figure 6 | Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate 