Out-of-Plane and In-Plane Magnetization Behavior of Dipolar Interacting FeNi Nanoislands around the Percolation Threshold

Figure 4

The difference between the FCW and ZFC normalized magnetization response shown in Figure 3 for the FeNi film samples (Al₂O₃ (2.1 nm)/FeNi ()/Sitall substrate) with the nominal film thickness (a) 0.61 nm, (b) 1.10 nm, and (c) 2.04 nm in the out-of-plane and in-plane sample configuration. The solid curves are the guides to the eye.