Journal of Nanomaterials / 2018 / Article / Fig 6

Research Article

Graphene Membrane as Suspended Mask for Lithography

Figure 6

(a) SEM image evidencing the narrowing of the geometries from the first (Al, right) to the second (V, left) deposition, affecting the vertical side, which are not affected by tilting on the pattern of Figure 5. (b) and (c) display the isotropic shrinkage of the mask due to deposition of metal at the edges and the anisotropic shrinkage related to the increase of the thickness of the mask, respectively.

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