Epitaxial Growth of Ru and Pt on Pt(111) and Ru(0001), Respectively: A Combined AES and RHEED Study

Figure 1

(1 × 1) RHEED patterns ([11-20] (a) and [0110] (b)) for Ru(0001) after argon ion sputtering and annealing at 1300 K under UHV conditions, showing 2D reflection streaks of the (±10) and (±11) beams; the RHEED patterns ([11-20] (c) and [0110] (d)) for Ru(0001) electrode covered by submonolayer Pt, showing intensity modulation along the substrate reflection rods; the RHEED pattern ([11-20]) for the Ru(0001) electrode covered by Pt deposit after second spontaneous deposition, showing additional reflection depicted by the arrow along the Ru substrate reflections (±10); the RHEED patterns ([11-20] (f) and [0110] (g)) for the Ru(0001) electrode covered by Pt (>1 ML) by spontaneous deposition (>3 min), showing 3D spots due to the Pt clusters; the indexed reciprocal lattice (h) of Figure 1(g); the RHEED pattern [11-20] (i) and its indexed reciprocal lattice (j) for the Ru(0001) electrode covered by Pt (>1 ML) by electrodeposition; (k) the indexed reciprocal lattices of the matrix and the twin for the marked part of Figure 1(j).

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