Abstract

This paper presents the spatial distribution of hot electrons along the channel of a 0.35 micron MOSFET using the full band pseudopotential Monte Carlo simulator DAMOCLES. The important aspect of this investigation is the implementation of a rigorous statistical enhancement technique along the channel of the device, to probe the hot electrons generated along the channel. Simulations have been carried out for different bias points. The results clearly show that the probability of generating electrons with energies sufficient for injection into the oxide layer is significant only at the drain side of the device. It is also observed that the peak gate current occurs exactly just inside the LDD region coincident with the position of maximum lateral electric field.