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VLSI Design
Volume 13, Issue 1-4, Pages 135-143
http://dx.doi.org/10.1155/2001/98032

Theoretical Investigation of Ultrathin Gate Dielectrics

1physical Sciences Research Labs, Motorola, Inc., Tempe 85284, AZ, USA
2Department of Physics and Astronomy, Ohio University, Athens 45701, OH, USA
3Department of Mathematics, Arizona State University, Tempe 85287, AZ, USA

Copyright © 2001 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Alexander A. Demkov, Xiaodong Zhang, and Heather Loechelt, “Theoretical Investigation of Ultrathin Gate Dielectrics,” VLSI Design, vol. 13, no. 1-4, pp. 135-143, 2001. https://doi.org/10.1155/2001/98032.