Structural Characteristics and Crystallization of Metallic Glass Sputtered Films by Using Zr System Target

Table 1

Thickness and compositions of as-sputtered films.

Targets	Films	Thickness of films (𝜇m)	Compositions (at.%)
			Zr	Al	Ni	Cu
BMG target	—	—	55.4	9.9	5.1	29.5
BMG	𝛼-BMG	0.74–0.76	46.0	22.2	10.3	21.5
	c-BMG	0.75–0.80	51.7	14.3	6.9	27.1
Elemental	Zr-Al-Ni-Cu	0.75–0.80	30.7	13.4	2.9	53.1
	Zr-Al-Cu	0.75–0.80	30.0	9.7	—	60.3