Deposition and Tribological Properties of Sulfur-Doped DLC Films Deposited by PBII Method

Table 1

Deposition conditions for S-DLC films, CH-DLC films, and DLC-SP film.

Sample no.	Bias voltages (kV)	Gas flow-rate ratios (C2H2 : SF6) or (C/S)	RF power (W)	Deposition pressure (Pa)
S-DLC 1	0	2 : 1	300	2
S-DLC 2	0	1 : 1	300	2
S-DLC 3	0	1 : 2	300	2
S-DLC 4	−5	2 : 1	300	2
S-DLC 5	−5	1 : 1	300	2
S-DLC 6	−5	1 : 2	300	2
CH-DLC 1	0	C2H2	300	2
CH-DLC 2	−5	C2H2	300	2
DLC-SP 1	DLC-SP film/target; C/pressure; 3 Pa/RF power; 500 W/gas; Ar