Research Article
Deposition and Tribological Properties of Sulfur-Doped DLC Films Deposited by PBII Method
Table 2
Hardness, elastic modulus relative concentration values of all films as a function of bias voltages, C/S flow-rate ratios, and various methods.
| | Sample no. | Bias voltages (kV) | C/S flow-rate ratio | Hardness (GPa) | Elastic modulus (GPa) | Relative concentration (at.%) | | Sulfur | Fluorine | Carbon |
| | S-DLC 1 | 0 | 2 : 1 | 6.7 | 55.8 | 2.9 | 1.6 | 95.5 | | S-DLC 2 | 0 | 1 : 1 | 6.0 | 50.2 | 3.3 | 2.0 | 94.7 | | S-DLC 3 | 0 | 1 : 2 | 4.8 | 36.2 | 4.9 | 2.3 | 92.8 | | S-DLC 4 | 5 | 2 : 1 | 14.8 | 124.3 | — | — | — | | S-DLC 5 | 5 | 1 : 1 | 13.0 | 115.2 | — | — | — | | S-DLC 6 | 5 | 1 : 2 | 8.9 | 83.7 | — | — | — | | CH-DLC 1 | 0 | C2H2 | 7.9 | 92.2 | — | — | — | | CH-DLC 2 | 5 | C2H2 | 9.8 | 129.6 | — | — | — | | DLC-SP | Target; C, Gas; Ar | 15.5 | 171.7 | — | — | — | | Si (100) wafer | 10.4 | 154.1 | — | — | — |
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