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Advances in Materials Science and Engineering
Volume 2012 (2012), Article ID 809028, 9 pages
http://dx.doi.org/10.1155/2012/809028
Research Article

Reactive Chemical Vapor Deposition Method as New Approach for Obtaining Electroluminescent Thin Film Materials

1Laboratory of Chemistry of Coordination Compounds, Chemistry Department, Lomonosov Moscow State University, 1-3 Leninskie Gory, 119991 Moscow, Russia
2Luminescence Division, Optical Department, Lebedev Physical Institute, 53 Leninsky Prosp., 119991 Moscow, Russia
3School of Chemistry, Centre for Synthesis and Chemical Biology, Trinity College Dublin, College Green, Dublin 2, Ireland

Received 21 March 2012; Revised 1 May 2012; Accepted 8 May 2012

Academic Editor: Yong Qiu

Copyright © 2012 Valentina V. Utochnikova et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Valentina V. Utochnikova, Oxana V. Kotova, Andrey A. Vaschenko, Leonid S. Lepnev, Alexei G. Vitukhnovsky, and Natalia P. Kuzmina, “Reactive Chemical Vapor Deposition Method as New Approach for Obtaining Electroluminescent Thin Film Materials,” Advances in Materials Science and Engineering, vol. 2012, Article ID 809028, 9 pages, 2012. doi:10.1155/2012/809028