Advances in Materials Science and Engineering / 2012 / Article / Tab 2

Review Article

Nonstoichiometry in Studied by Ion Beam Methods and Photoelectron Spectroscopy

Table 2

Summary of the microanalysis of by RBS and NRA; : deposition rate, : film thickness, : surface number of oxygen atoms, : surface number of titanium atoms, : film density; calculated density of anatase  g/cm3 and calculated density of rutile  g/cm3 according to [1].

Sample/substrateDeposition methodTime (sec) (nm/s) (nm) (at/cm2) from NRA (at/cm2) from RBS (at/cm2) from RBS (g/cm3) from RBS

Na1/Cdc magnetron sputtering411.4358–603.253.031.583.17–3.39
Na2/Cdc magnetron sputtering481.1754–583.363.201.523.67–3.94
Na3/Cdc magnetron sputtering570.9852–583.413.09–3.221.433.67–4.09
Na4/Cdc magnetron sputtering720.7654–563.162.791.403.22–3.33
Na5/Cdc magnetron sputtering950.5450–522.532.69–2.741.313.15–3.27
Na6/Cdc magnetron sputtering1430.2332–342.452.481.163.35–4.60
M50/Crf sputtering27500.0250–603.542.931.573.27–3.92
M50/Si/ SiO2rf sputtering27500.0250–607.951.63.27–3.92
WO_1/Sirf sputtering150000.02300179.133.7

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