Advances in Materials Science and Engineering / 2012 / Article / Tab 4

Review Article

Nonstoichiometry in Studied by Ion Beam Methods and Photoelectron Spectroscopy

Table 4

Relative contributions (%) to the Ti and O 1s XPS lines from the different oxidation states for thin films deposited by the reactive sputtering.

(nm/s)OIIOI Ti4+Ti3+/Ti2+Ti0

1.8219810.1975.410.514.1
0.8815850.1591.55.13.4
0.2313870.1391.94.73.4

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