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</svg> Thin Film Prepared by Sputter Deposition and Post-N<sup  >+</sup> Ion Implantation

<table>XRD patterns and FE-SEM cross-sectional images of the A-, R-, and M-TiO<sub>2</sub> thin film.</table>

Advances in Materials Science and Engineering

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Figure 1

Figure 1: Characteristics and Photocatalytic Properties of <svg style="vertical-align:-4.50008pt;width:44.5px;" id="M1" height="21.0375" version="1.1" viewBox="0 0 44.5 21.0375" width="44.5"  xmlns="http://www.w3.org/2000/svg">
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</svg> Thin Film Prepared by Sputter Deposition and Post-N<sup  >+</sup> Ion Implantation 

Figure 1 | Characteristics and Photocatalytic Properties of 
	
		
			
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Advances in Materials Science and Engineering

Characteristics and Photocatalytic Properties of T i O 2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation

Figure 1

Characteristics and Photocatalytic Properties of Thin Film Prepared by Sputter Deposition and Post-N⁺ Ion Implantation