Advances in Materials Science and Engineering / 2012 / Article / Fig 3

Research Article

Characteristics and Photocatalytic Properties of T i O 2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation

Figure 3

XRD patterns of the unirradiated A-, R-, and M-TiO2 thin film and the irradiated A-, R-, and M-TiO2 thin film with an ion dose of 2.5 × 1015, 5.0 × 1015, and 7.5 × 1015 ions/cm2.

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