Characteristics and Photocatalytic Properties of Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation
Figure 3
XRD patterns of the unirradiated A-, R-, and M-TiO2 thin film and the irradiated A-, R-, and M-TiO2 thin film with an ion dose of 2.5 × 1015, 5.0 × 1015, and 7.5 × 1015 ions/cm2.