Characteristics and Photocatalytic Properties of <svg style="vertical-align:-4.50008pt;width:44.5px;" id="M1" height="21.0375" version="1.1" viewBox="0 0 44.5 21.0375" width="44.5"  xmlns="http://www.w3.org/2000/svg">
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</svg> Thin Film Prepared by Sputter Deposition and Post-N<sup  >+</sup> Ion Implantation

<table>Transmittance changes of the methylene blue solution under sterilization lamp (S.L.) as UV light and artificial lamp (A.L.) as visible light for the unirradiated A-, R-, and M-TiO<sub>2</sub> thin film and the irradiated A-, R-, and M-TiO<sub>2</sub> thin film with an <svg height="14.2625" id="M48" style="vertical-align:-0.12283pt" version="1.1" viewbox="0 0 20.362499 14.2625" width="20.362499" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg> ion dose of 2.5 × 10<sup>15</sup>, 5.0 × 10<sup>15</sup>, and 7.5 × 10<sup>15</sup> ions/cm<sup>2</sup>.</table>

Advances in Materials Science and Engineering

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Figure 5

Figure 5: Characteristics and Photocatalytic Properties of <svg style="vertical-align:-4.50008pt;width:44.5px;" id="M1" height="21.0375" version="1.1" viewBox="0 0 44.5 21.0375" width="44.5"  xmlns="http://www.w3.org/2000/svg">
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</svg> Thin Film Prepared by Sputter Deposition and Post-N<sup  >+</sup> Ion Implantation 

Figure 5 | Characteristics and Photocatalytic Properties of 
	
		
			
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Advances in Materials Science and Engineering

Characteristics and Photocatalytic Properties of T i O 2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation

Figure 5

Characteristics and Photocatalytic Properties of Thin Film Prepared by Sputter Deposition and Post-N⁺ Ion Implantation