Series Resistance Analysis of Passivated Emitter Rear Contact Cells Patterned Using Inkjet Printing
Figure 5
(a) Open-circuit PL image of a PERC cell fabricated using BA-LIP Ni and LIP Cu plating. The edges of the cell have been isolated with a laser. Red circles are shunt locations. Blue circle location of a peeled finger; (b) series resistance PL image of the same cell using a bias voltage of −300 mV.
