Series Resistance Analysis of Passivated Emitter Rear Contact Cells Patterned Using Inkjet Printing

Table 3

Cell performance from light IV data.

Ni-plating method	𝑉oc (mV)	Fill factor	Series resistance (Ω⋅cm^2)	Shunt resistance (kΩ⋅cm^2)
Electroless Ni	646	0.61	4.1	42.7
Bias-assisted LIP Ni	617	0.59	1.5	0.10