Research Article

Effects of High Magnetic Field Postannealing on Microstructure and Properties of Pulse Electrodeposited Co-Ni-P Films

Figure 2

XRD patterns of Co-Ni-P films: (a) as-deposited and annealed at 673 K for 4 h in a magnetic field of (b)  T, (c)  T, and (d)  T. The right side was the amplified zone at the angular position from ° to 48°.