Research Article
Effects of High Magnetic Field Postannealing on Microstructure and Properties of Pulse Electrodeposited Co-Ni-P Films
Figure 2
XRD patterns of Co-Ni-P films: (a) as-deposited and annealed at 673 K for 4 h in a magnetic field of (b) T, (c) T, and (d) T. The right side was the amplified zone at the angular position from ° to 48°.