Research Article
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
Table 1
Conditions for deposition and lithography of each layer.
| | Spin max speed (RPM) | SB | PEB | HB | Exposure | Dose
| Development time (s) |
| SU-8 2001 | 3000 | 60 s at 65°C & 60 s at 95°C | SB | 15 min at 200°C | Mask | 162 | 60 | SU-8 2010 | 3500 | 60 s at 65°C & 180 s at 95°C | SB | 15 min at 200°C | Mask | 189 | 180 | SU-8 2050 | 4000 | 180 s at 65°C & 240 s at 95°C | SB | 15 min at 200°C | Mask | 324 | 300 | AZ-9260 | 2500 | 210 s at 105°C | None | None | Flood | 128 | 210 | Microposit S1400-31 | 5500 | 180 s at 95°C | None | None | Flood | 108 | 45 |
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