The Effect of the Rolling Direction, Temperature, and Etching Time on the Photochemical Machining of Monel 400 Microchannels

<div>(a) Effect of spinning speed on photoresist film thickness for a spinning time of 50 s. (b) Effect of photoresist coating on etching of micro channels. (i) Substrate with photoresist film thickness of 9.20 <i>μ</i>m; (ii) substrate with photoresist film thickness of 15.16 <i>μ</i>m. (c) Effect of spinning time on photoresist film thickness for a spinning speed of 5000 rpm.</div>

Advances in Materials Science and Engineering

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Figure 3

Figure 3: The Effect of the Rolling Direction, Temperature, and Etching Time on the Photochemical Machining of Monel 400 Microchannels 