The Effect of the Rolling Direction, Temperature, and Etching Time on the Photochemical Machining of Monel 400 Microchannels

Table 2

Channel width and strength of photoresist obtained by different exposure times.

Experiment number	Exposure time (s)	Image width (μm)	Photoresist strength (N)
1	30	120.3	18.8
2	60	116.7	19.3
3	90	108.0	19.7
4	120	99.7	20.0
5	150	98.2	20.1
6	180	97.6	20.7
7	210	96.3	21.0